Leica Microsystems EM RES102 Application Note

Brand: Leica Microsystems

Model: EM RES102

Type: Application Note

Leica Microsystems EM RES102 is a high-resolution sample preparation system for electron microscopy. It uses a focused ion beam to mill and image samples, allowing for precise and detailed analysis of materials. With its advanced capabilities, the EM RES102 is ideal for a wide range of applications, including:

Cross-sectioning of materials: The EM RES102 can be used to create high-quality cross-sections of materials, revealing their internal structure and composition. This information is valuable for failure analysis, materials characterization, and other applications.
Surface modification: The EM RES102 can be used to modify the surface of materials, creating specific patterns or structures. This capability is useful for a variety of applications, such as microelectronics fabrication, optics, and biomedical engineering.

Cross-sectioning of materials: The EM RES102 can be used to create high-quality cross-sections of materials, revealing their internal structure and composition. This information is valuable for failure analysis, materials characterization, and other applications.
Surface modification: The EM RES102 can be used to modify the surface of materials, creating specific patterns or structures. This capability is useful for a variety of applications, such as microelectronics fabrication, optics, and biomedical engineering.

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Application Note

Contrast enhancement of polished cross sections of

multi-layer systems

Sample Preparation for SEM

related instrument Leica EM RES102

Contrast enhancement of polished cross

sections of multi-layer systems

Determination of the layer thickness

PROBLEM

The cross-section of a steel sample coated with Cu and Ni should be selectively milled to increase the contrast.

The goal was to determine the layer thickness of the Cu and Ni as accurately as possible using the scanning elec-

tron microscope. In order to do this, it was necessary to determine the optimal milling time, as the boundary sur-

face structures could be distorted by milling times that are too long.

PREPARATION CONDITIONS

Sample holder: SEM standard holder

Acceleration voltage: 5 kV

Milling angle: 30°

Milling time: 30 sec to 4 min 30 sec

RESULTS

The SEM images show the increase in contrast with increasing milling time. A milling time of 2 min 30 sec. ap-

pears to be optimal for the determination of the layer depth. After 4 min 30 sec, the grain structure of the indi-

vidual layers can be seen very clearly.

Fig. 1: Sample after mechanical polishing

Fig. 2: Sample after 2'30" (top) and after 4'30" contrast enhancement (bottom)

LNT Application Note - CONTRAST ENHANCEMENT OF MULTI-L AYER SYSTEMS

Multi-layer systems with individual layers of different hardness

PROBLEM

Ground sections of multi-layer systems with individual layers of different hardness often show rounded or

blurred boundary surfaces. In addition, the structures (e.g., the grain structure) are hardly discernable in the

microscope. With the help of ion beam milling, the boundary surface structures should be exposed and the

grain structures of the individual layers be reinforced.

PREPARATION CONDITIONS

Sample holder: SEM standard holder

Acceleration voltage: 6 kV

Milling angle: 15° and 90°

Sample movement: Rotation

Milling time: 10 min to 15 min (15°)

1 min to 3 min (90°)

RESULTS

The milling of the ground section surfaces with a milling angle of 15° with respect to the surface of the

samples resulted in a cleaning effect. As a result, the blurred boundary surface areas were exposed, so

that, for example, the layer delamination could be seen. The subsequent milling at 90° makes the grain

structure of the poly-crystalline layers visible.

Fig.3: SEM images of a cross-section of a multi-layer system before (top) and

after (lower) the ion milling with clearly visible delamination

LNT Application Note - CONTRAST ENHANCEMENT OF MULTI-L AYER SYSTEMS

The statement by Ernst Leitz in 1907, “With the User, For the User,”

describes the fruitful collaboration with end users and driving force of

innovation at Leica Microsystems. We have developed five brand

values to live up to this tradition: Pioneering, High-end Quality, Team

Spirit, Dedication to Science, and Continuous Improvement. For us,

living up to these values means: Living up to Life.

LIFE SCIENCE DIVISION - NANO TECHNOLOGY LNT

The Leica Microsystems Nano Technology Division’s focus is to

provide the most compehensive product portfolio for the preparation

of biological, medical and industrial samples for investigation in the

Electron and Light Microscope. Excellent Sample Preparation is a

prerequisite for perfect microscopy. Your image starts here!

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Leica EM RES102 Application Note: Contrast enhancement of multi-layer systems ∙

modifications. LEICA and the Leica Logo are registered trademarks of Leica Microsystems

Leica Microsystems EM RES102 Application Note

Brand: Leica Microsystems

Model: EM RES102

Type: Application Note

Cross-sectioning of materials: The EM RES102 can be used to create high-quality cross-sections of materials, revealing their internal structure and composition. This information is valuable for failure analysis, materials characterization, and other applications.
Surface modification: The EM RES102 can be used to modify the surface of materials, creating specific patterns or structures. This capability is useful for a variety of applications, such as microelectronics fabrication, optics, and biomedical engineering.

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Leica Microsystems EM RES102 Application Note

Leica Microsystems EM RES102 Application Note

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